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Proceedings Paper

Krypton Fluoride Excimer Laser for Microlithography
Author(s): R. L. Sandstrom; R. P. Akins; U. K. Sengupta; C. Reiser; D. G. Larson; S. L. Anderson
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Paper Abstract

We present the design concepts and performance data for a spectrally-narrowed, wavelength-stabilized KrF laser that meets the specialized requirements of a deep-UV light source for a stepper. Features include: (1) compact size (54cm W x 45cm H x 128cm L), (2) 3 Watt average power with spectral width of 0.003 nm FWHM, (3) long fuel gas life from premixed bottles attained without the need for a gas reprocessor or boost gas, (4) fast and precise wavelength control system that maintains a user-specifiable wavelength to within 0.0005 nm anywhere in the KrF tuning range, (5) microprocessor control, including SECS or custom control protocols, (6) robust, modular internal design for rapid repair, and (7) engineering and packaging that meets semiconductor production tool safety requirements.

Paper Details

Date Published: 25 July 1989
PDF: 9 pages
Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); doi: 10.1117/12.953169
Show Author Affiliations
R. L. Sandstrom, Cymer Laser Technologies (United States)
R. P. Akins, Cymer Laser Technologies (United States)
U. K. Sengupta, Cymer Laser Technologies (United States)
C. Reiser, Cymer Laser Technologies (United States)
D. G. Larson, Cymer Laser Technologies (United States)
S. L. Anderson, Cymer Laser Technologies (United States)


Published in SPIE Proceedings Vol. 1088:
Optical/Laser Microlithography II
Burn Jeng Lin, Editor(s)

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