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Proceedings Paper

Advanced Lithography Excimer System: Absolute Wavelength Adjustment, Five Watt Average Power
Author(s): P. Oesterlin; P. Lokai; B. Burghardt; W. Muckenheim; H.-J. Kahlert; D. Basting
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Paper Abstract

A commercial Lambda 248 L excimer system has been equipped with a newly developed wavemeter. The self-controlling laser system can be stabilized at a pre-selected wavelength in the range of 248.180 to 248.580 nm with an absolute accuracy of ± 0.001 nm. Due to the deep-UV stepper optics the wavelength can be adjusted absolutely to comply with different optics. The modified 248 L-system can be operated at an average power of up to 5 W. Experimental results are presented.

Paper Details

Date Published: 25 July 1989
PDF: 3 pages
Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); doi: 10.1117/12.953168
Show Author Affiliations
P. Oesterlin, Lambda Physik GmbH (FRG)
P. Lokai, Lambda Physik GmbH (FRG)
B. Burghardt, Lambda Physik GmbH (FRG)
W. Muckenheim, Lambda Physik GmbH (FRG)
H.-J. Kahlert, Lambda Physik GmbH (FRG)
D. Basting, Lambda Physik GmbH (FRG)


Published in SPIE Proceedings Vol. 1088:
Optical/Laser Microlithography II
Burn Jeng Lin, Editor(s)

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