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Proceedings Paper

Modeling Of Optical Alignment Images For Semiconductor Structures
Author(s): Chi-Min Yuan; Jerry Shaw; William Hopewell
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Paper Abstract

The "wave-guide" model which can be used to study the light scattering problem in optical alignment, has been extended to include illumination with arbitrary polarization and large numerical aperture (NA) lens. An existing simulator has been enhanced to calculate the images of different structures observed under different alignment schemes. It is shown that variations in the polarization conditions and topography may drastically alter the alignment results.

Paper Details

Date Published: 25 July 1989
PDF: 12 pages
Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); doi: 10.1117/12.953167
Show Author Affiliations
Chi-Min Yuan, Carnegie Mellon University (United States)
Jerry Shaw, IBM Thomas J. Watson Research Center (United States)
William Hopewell, IBM Thomas J. Watson Research Center (United States)

Published in SPIE Proceedings Vol. 1088:
Optical/Laser Microlithography II
Burn Jeng Lin, Editor(s)

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