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Proceedings Paper

An Analytical Model For The Aerial Image Simulation Of 2-D Mask Structures. Optimization Of The ODB Tapering Method
Author(s): Marco I. Buraschi; Renzo Traversini
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Paper Abstract

An analytical model for 2-D non periodic aerial image simulation is proposed for rectangular and circular mask structures. As applications we demonstrate that better resolution in contact opening is acheivable if near circular pattern are designed at mask level. Examples of optimized aerial image for ODB tapering method are shown. Influence of defects on the reticle are considered.

Paper Details

Date Published: 25 July 1989
PDF: 13 pages
Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); doi: 10.1117/12.953166
Show Author Affiliations
Marco I. Buraschi, SGS-Thomson Microelectronics (Italy)
Renzo Traversini, SGS-Thomson Microelectronics (Italy)

Published in SPIE Proceedings Vol. 1088:
Optical/Laser Microlithography II
Burn Jeng Lin, Editor(s)

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