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Proceedings Paper

ANKAN : Simulator for Resist Exposure and Etching
Author(s): Shri N. Gupta; R. Mehrotra; N. N. Kundu; B. P. Mathur
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Paper Abstract

In this paper, we report the results of ANKAN, a computer program written for the exposure and development of positive photoresist using matrix formulation. Exposure process is modelled using diffraction limited optics and partially coherent light source with a wavelength λ. The program uses string model for resist development. The results of theoretical computations are reported and are found to be in good agreement with those of previous workers. In addition, the program can also be used for computing edge threshold for linewidth measurement and predicting the shape of aerial image for two dimensional objects.

Paper Details

Date Published: 25 July 1989
PDF: 4 pages
Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); doi: 10.1117/12.953165
Show Author Affiliations
Shri N. Gupta, Central Electronics Engineering Research Institute (India)
R. Mehrotra, BITS Pilani (India)
N. N. Kundu, ECE Deptt. NIHE (Ireland)
B. P. Mathur, Central Electronics Engineering Research Institute (India)


Published in SPIE Proceedings Vol. 1088:
Optical/Laser Microlithography II
Burn Jeng Lin, Editor(s)

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