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Proceedings Paper

Improving Photolithographic Tool Utilization Through An Advanced System Interface
Author(s): Curtis B. Timmerman; John J. Festa; Randall M. Young
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Paper Abstract

One of the major challenges facing the semiconductor industry today is to be able to respond to an increasingly competitive environment. One effective strategy is to reduce costs through advanced operation, maintenance, and information flow techniques for manufacturing equipment. This approach can yield very beneficial results for manufacturing economics.

Paper Details

Date Published: 25 July 1989
PDF: 11 pages
Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); doi: 10.1117/12.953155
Show Author Affiliations
Curtis B. Timmerman, The Perkin-Elmer Corporation (United States)
John J. Festa, The Perkin-Elmer Corporation (United States)
Randall M. Young, The Perkin-Elmer Corporation (United States)

Published in SPIE Proceedings Vol. 1088:
Optical/Laser Microlithography II
Burn Jeng Lin, Editor(s)

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