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Proceedings Paper

Linear/Angular Displacement Interferometer For Wafer Stage Metrology
Author(s): Gary E. Sommargren
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Paper Abstract

A dual measurement interferometer has been developed specifically for wafer stage metrology. The interferometer concurrently measures both linear and angular displacement. It is designed to conserve space, minimize stage mass, eliminate heat sources and provide high resolution and slew rate.

Paper Details

Date Published: 25 July 1989
PDF: 6 pages
Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); doi: 10.1117/12.953154
Show Author Affiliations
Gary E. Sommargren, Zygo Corporation (United States)


Published in SPIE Proceedings Vol. 1088:
Optical/Laser Microlithography II
Burn Jeng Lin, Editor(s)

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