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Proceedings Paper

Investigation Of Linewidth Uniformity In X-Ray Lithography
Author(s): U. Mescheder; U. Mackens; F. Mund
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Paper Abstract

Recently several groups have reported about the production of half micron devices using SOR X-ray lithography /1,2,3/. The device performance was compared to those devices produced by using other lithographic techniques (e.g. electron beam direct writing). However, for future applications it is necessary to fulfill the more stringent subhalf micron design rules. One important challenge is the linewidth control within several nm and the impact on yield, device quality and overlay accuracy.

Paper Details

Date Published: 19 July 1989
PDF: 11 pages
Proc. SPIE 1087, Integrated Circuit Metrology, Inspection, and Process Control III, (19 July 1989); doi: 10.1117/12.953112
Show Author Affiliations
U. Mescheder, Philips GmbH Forschungslabor (Germany)
U. Mackens, Philips GmbH Forschungslabor (Germany)
F. Mund, RHW Hamburg der Philips GmbH (Germany)


Published in SPIE Proceedings Vol. 1087:
Integrated Circuit Metrology, Inspection, and Process Control III
Kevin M. Monahan, Editor(s)

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