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Proceedings Paper

Optical Phase-Shifting Technique For Submicron Linewidth Measurement: Simulations And Measurements
Author(s): Yiping Xu; Evelyn Hu; Susan Hackwood; Glen Wade
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Paper Abstract

We have proposed a novel phase-shifting and Fourier transform technique for linewidth measurement. The novelty of the technique is the transfer of linewidth information into the zero-order spatial frequency component of the image. The method we proposed incorporates phase-cancellation and spatial Fourier transform to achieve resolution beyond the Rayleigh diffraction limit and should be applicable for metrology of sub-micron features. Theoretical analyses have shown that this technique will be viable well into the submicron range. Experimental measurements have been made on different features having relatively large dimensions (~ 100 μm) to verify the theory. Experimental results have demonstrated the validity of the concept and given the directions of practical limitations and requirements of the approach in order to obtain true submicron linewidth measurement. Such limitations include consideration of the precision of lateral translation of phase mask with respect to substrate, and of the mask to substrate distance. Further, extensive simulations of the robustness of this technique with respect to material composition, contrast and feature morphology (slope and height of the linewidth features) have been carried out for both individual and periodic features.

Paper Details

Date Published: 19 July 1989
PDF: 10 pages
Proc. SPIE 1087, Integrated Circuit Metrology, Inspection, and Process Control III, (19 July 1989); doi: 10.1117/12.953108
Show Author Affiliations
Yiping Xu, University of California (United States)
Evelyn Hu, University of California (United States)
Susan Hackwood, University of California (United States)
Glen Wade, University of California (United States)


Published in SPIE Proceedings Vol. 1087:
Integrated Circuit Metrology, Inspection, and Process Control III
Kevin M. Monahan, Editor(s)

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