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Proceedings Paper

Sub 0.5 Micron Optical Metrology
Author(s): Brian Chisholm; Don Yansen; Christopher Morrill
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Paper Abstract

Recent studies show that white light, or broadband, metrology systems continue to be used as the "work-horse" method for measuring features at 1.0 micron and below in production manufacturing environments. With the advances in the area of broadband optical metrology using sophisticated digital-image enhancement techniques, production quality measurements are now possible down to 0.5 micron and below. The purpose of this paper is to show substantial evidence that reliable, fully automatic, high speed, dynamic mode measurements can be made using optical methods on substrates in the range of 0.5 to 0.3 microns, with excellent repeatability and correlation to a SEM reference.

Paper Details

Date Published: 19 July 1989
PDF: 8 pages
Proc. SPIE 1087, Integrated Circuit Metrology, Inspection, and Process Control III, (19 July 1989); doi: 10.1117/12.953107
Show Author Affiliations
Brian Chisholm, IVS, Inc. (United States)
Don Yansen, IVS, Inc. (United States)
Christopher Morrill, IVS, Inc. (United States)

Published in SPIE Proceedings Vol. 1087:
Integrated Circuit Metrology, Inspection, and Process Control III
Kevin M. Monahan, Editor(s)

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