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Proceedings Paper

Resist Profile Control Obtained Through A Desirability Function And Statistically Designed Experiments
Author(s): K. L. Bell; L. D. H. Christensen
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Paper Abstract

This paper describes a technique used to determine an optimized microlithographic process using statistical methods which included a statistically designed experiment (SDE); a desirability function, d(θ*); and a rigorous daily statistical process control program, (SPC).

Paper Details

Date Published: 19 July 1989
PDF: 13 pages
Proc. SPIE 1087, Integrated Circuit Metrology, Inspection, and Process Control III, (19 July 1989); doi: 10.1117/12.953102
Show Author Affiliations
K. L. Bell, Morton Thiokol, Inc. (United States)
L. D. H. Christensen, Morton Thiokol, Inc. (United States)

Published in SPIE Proceedings Vol. 1087:
Integrated Circuit Metrology, Inspection, and Process Control III
Kevin M. Monahan, Editor(s)

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