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Proceedings Paper

Data Regression Procedure For Comparative Evaluation Of Photolithography Systems
Author(s): Robert L. Brown; Alan Levine
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Paper Abstract

A procedure has been developed for the analysis of the performance of photolithography systems. This procedure uses statistical methods to characterize the system. This is done by using small number of process observations to determine the values of coefficients of an empirical model. The predictions of the model can then be used to determine such factors as the full process volume and anticipated process stability. The method is demonstrated by a case study of an evaluation of a multi-dimensional process space.

Paper Details

Date Published: 19 July 1989
PDF: 10 pages
Proc. SPIE 1087, Integrated Circuit Metrology, Inspection, and Process Control III, (19 July 1989); doi: 10.1117/12.953097
Show Author Affiliations
Robert L. Brown, Ultratech Stepper (United States)
Alan Levine, Ultratech Stepper (United States)


Published in SPIE Proceedings Vol. 1087:
Integrated Circuit Metrology, Inspection, and Process Control III
Kevin M. Monahan, Editor(s)

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