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Proceedings Paper

Statistical Correlation Between Optical Linewidth Measurement Systems With Variance Components Analysis
Author(s): Eileen Jozefov; Paul Mullenix; Wayne Ruch
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Paper Abstract

Much has been written in the literature concerning the importance of linewidth measurement in controlling the lithographic process. Numerous sources of variability in both the process and the measurement system itself complicate linewidth measurement and control. For this reason, linewidth measurement standards have been developed for use in calibrating systems to provide information as to the precision and variability of the systems in terms of 3-sigma values. In a manufacturing environment however, the measurement system used to determine the final critical dimension is not necessarily the same system that was used to measure the particular dimension during processing. This raises a question concerning the compatibility of the measurement systems. It is therefore desirable to acquire an understanding of the significant differences, if present, between different measurement systems. This can be accomplished by examining the statistical correlation of measurements and by employing statistical models to identify, quantify and compare sources of system variability independent of process variability. Statistical correlation analysis offers a method for assessing the relationship of linewidth measurements and repeatability of different systems. In addition, system variation on factors influencing CD measurements can be modeled using variance components analysis, quantified and evaluated as to significance. Properties to be modeled include repeatability, agreement on accuracy, and precision for various feature types and sizes. The statistical models developed may also be used for calibration purposes. Statistical properties for both standard and alternative calibration procedures will be discussed. Briefly discussed will be Response Surface Methodology for obtaining combinations of factors which tend to minimize linewidth variability.

Paper Details

Date Published: 19 July 1989
PDF: 12 pages
Proc. SPIE 1087, Integrated Circuit Metrology, Inspection, and Process Control III, (19 July 1989); doi: 10.1117/12.953089
Show Author Affiliations
Eileen Jozefov, Harris Semiconductor (United States)
Paul Mullenix, Harris Semiconductor (United States)
Wayne Ruch, Harris Semiconductor (United States)


Published in SPIE Proceedings Vol. 1087:
Integrated Circuit Metrology, Inspection, and Process Control III
Kevin M. Monahan, Editor(s)

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