Share Email Print

Proceedings Paper

An Analysis Of Electron Beam Registration Capabilities By Electrical Measurement Methods
Author(s): James P. Rominger
Format Member Price Non-Member Price
PDF $17.00 $21.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The use of electrical test patterns is examined as an analysis tool for electron beam (e-beam) pattern writing systems. The method makes extensive use of electrical linewidth measurement structures and pattern redundancy to determine pattern placement accuracy and fidelity on a single reticle layer. Significant improvement in resolution and repeatability over conventional optical based measurement systems is apparent. The quantity of data that was collected quickly and automatically provides an accurate and large-scale view of subtle distortions caused by both the e-beam and reticle processing.

Paper Details

Date Published: 19 July 1989
PDF: 13 pages
Proc. SPIE 1087, Integrated Circuit Metrology, Inspection, and Process Control III, (19 July 1989); doi: 10.1117/12.953083
Show Author Affiliations
James P. Rominger, Ultratech Stepper Corporation (United States)

Published in SPIE Proceedings Vol. 1087:
Integrated Circuit Metrology, Inspection, and Process Control III
Kevin M. Monahan, Editor(s)

© SPIE. Terms of Use
Back to Top