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Proceedings Paper

Accuracy of Spatial Metrology
Author(s): Karl Harris; Israel Nadler-Niv; Dorron Levy
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Paper Abstract

The advantages of electron-beam based metrology over photon-optical have been well established. Those advantages include (1) the ability to truly resolve feature ulgo of 0.1 μm or less, (2) the ability to accurately measure features with aspect ragas above 1 to 1, and (3) negligible sensitivity to thickness variationsl . A further advancement of e-beam based metrology is a novel method called. Spatial Metrology, introduced at this conference last year. Spatial Metrology is not based on the e-beam image but rather on a unique secondary electron signal. The major advantage of Spatial Metrology is accurate top and bottom linewidth measurement, without the need to cross section the wafer.

Paper Details

Date Published: 19 July 1989
PDF: 7 pages
Proc. SPIE 1087, Integrated Circuit Metrology, Inspection, and Process Control III, (19 July 1989); doi: 10.1117/12.953079
Show Author Affiliations
Karl Harris, Opal Inc. (United States)
Israel Nadler-Niv, Opal Inc. (United States)
Dorron Levy, Opal Inc. (United States)


Published in SPIE Proceedings Vol. 1087:
Integrated Circuit Metrology, Inspection, and Process Control III
Kevin M. Monahan, Editor(s)

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