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Proceedings Paper

Simulation Of Latent Image Manipulation A Versatile Simulation Program For New Photolithographic Systems
Author(s): R. J. Visser; H. P. Urbach; A. J. W. Tol; H. Eggink; E. G. H. M. Kemna
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Paper Abstract

A program for simulating latent image formation in a photoresist for complex photolithographical systems is described. For a number of new photolithographic systems, which use more than one exposure and several different chemical reactions, the concentration profiles of the chemical components of the resist can be calculated with this program. Some results for positive imaging, Image Reversal, Built In Mask and ImRe with two pattern-wise exposures are given.

Paper Details

Date Published: 30 January 1989
PDF: 10 pages
Proc. SPIE 1086, Advances in Resist Technology and Processing VI, (30 January 1989); doi: 10.1117/12.953072
Show Author Affiliations
R. J. Visser, Philips Research Laboratories (Netherlands)
H. P. Urbach, Philips Research Laboratories (Netherlands)
A. J. W. Tol, Philips Research Laboratories (Netherlands)
H. Eggink, Philips Research Laboratories (Netherlands)
E. G. H. M. Kemna, Philips Research Laboratories (Netherlands)


Published in SPIE Proceedings Vol. 1086:
Advances in Resist Technology and Processing VI
Elsa Reichmanis, Editor(s)

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