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Proceedings Paper

Evaluating Process Optimums for Production VLSI Lithography
Author(s): Erik S. Brown; William C. Nelson; Gene Howland
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Paper Abstract

A new statistical analysis technique will be shown for process comparisons and optimization in production photolithography. The experimental layout proposed allows for efficient collection of data off-line for calculation of a process index relating the 6 sigma repeatability to assumed specification limits for each experimental cell of a full factorial experiment. Appropriate blocking of the experiment and number of repeats used allows the process index to be compared to the process capability calculations in popular use throughout the semiconductor industry.

Paper Details

Date Published: 30 January 1989
PDF: 8 pages
Proc. SPIE 1086, Advances in Resist Technology and Processing VI, (30 January 1989); doi: 10.1117/12.953068
Show Author Affiliations
Erik S. Brown, Hoechst Celanese Corporation (United States)
William C. Nelson, Hoechst Celanese Corporation (United States)
Gene Howland, Unisys Corporation (United States)


Published in SPIE Proceedings Vol. 1086:
Advances in Resist Technology and Processing VI
Elsa Reichmanis, Editor(s)

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