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Proceedings Paper

Improved Bake Latitude Organic Anti-Reflective Coatings for High Resolution Metallisation Lithography
Author(s): B. Martin; A. N. Odell; J. E. Lamb
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Paper Abstract

The application of a new organic anti-reflective coating layer, "ARC-XL" from Brewer Science Inc. is described for high resolution metallisation lithography. The "ARC-XL" is soluble in positive resist developer and is removed in the same process step as the exposed resist so that particular attention is paid to "ARC-XL" bake conditions. The enhanced process latitude to be gained using "ARC-XL" with a high temperature resist is compared to latitude without "ARC-XL" by both electron microscopy and electrical linewidth measurement. "PROLITH" simulations confirm the enhanced process latitude to be gained using "ARC-XL". Further modelling shows resist sidewall profiles with and without "ARC-XL" as a function of stepper focus and exposure.

Paper Details

Date Published: 30 January 1989
PDF: 12 pages
Proc. SPIE 1086, Advances in Resist Technology and Processing VI, (30 January 1989); doi: 10.1117/12.953066
Show Author Affiliations
B. Martin, Plessey Research (Caswell) Ltd (England)
A. N. Odell, Plessey Research (Caswell) Ltd (England)
J. E. Lamb, Plessey Research (Caswell) Ltd (England)

Published in SPIE Proceedings Vol. 1086:
Advances in Resist Technology and Processing VI
Elsa Reichmanis, Editor(s)

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