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Proceedings Paper

Reducing The Process "K" Factor With Surface Imaging Techniques
Author(s): Mike Tipton; Cesar Garza; Tom Seha
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Paper Abstract

The standard Rayleigh relation for the resolution of an optical system states that the resolution is proportional to the exposure wavelength divided by the numerical aperture of the system. The constant of proportionality "k" is directly effected by processing techniques and may be reduced depending on the chosen photoitsist process. Reducing the "k" factor directly impacts the manufacturing of advanced integrated circuits since it implies the ability to resolve finer features without the ever larger capital expenditures required for new exposure tools. It also allows the execution of current processes with increased processing latitude. This paper reports on the results obtained using a surface imaging technique to reduce the "k" factor for standard and advanced processing applications.

Paper Details

Date Published: 30 January 1989
PDF: 8 pages
Proc. SPIE 1086, Advances in Resist Technology and Processing VI, (30 January 1989); doi: 10.1117/12.953054
Show Author Affiliations
Mike Tipton, Texas Instruments Inc. (United States)
Cesar Garza, Texas Instruments Inc. (United States)
Tom Seha, Texas Instruments Inc. (United States)

Published in SPIE Proceedings Vol. 1086:
Advances in Resist Technology and Processing VI
Elsa Reichmanis, Editor(s)

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