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Proceedings Paper

Positive-Working Polyimide Resists Based On Diazonaphthoquinone Photochemistry
Author(s): Mary G. Moss; Ruth M. Cuzmar; Terry Brewer
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Paper Abstract

Polyimides have many desirable properties for use in the microelectronics industry, including ease of application, excellent planarization capability, and good electrical insulating properties. A polyamic acid that is also an imagable resist simplifies processing by eliminating the need for separate resist application and removal steps. Negative-working polyimide resists are quite common, but there are very few examples of positive-working polyimide-based resists. In this paper, we describe a positive polyimide resist which is based upon a diazonaphthoquinone dissolution inhibitor that is standard in the resist industry. The positive polyimide resist described here has high resolution, high heat resistance, and excellent dielectric properties.

Paper Details

Date Published: 30 January 1989
PDF: 10 pages
Proc. SPIE 1086, Advances in Resist Technology and Processing VI, (30 January 1989); doi: 10.1117/12.953052
Show Author Affiliations
Mary G. Moss, Brewer Science, Inc.. (United States)
Ruth M. Cuzmar, Brewer Science, Inc. (United States)
Terry Brewer, Brewer Science, Inc. (United States)


Published in SPIE Proceedings Vol. 1086:
Advances in Resist Technology and Processing VI
Elsa Reichmanis, Editor(s)

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