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Proceedings Paper

Polyhydroxystyrene Carbonate Esters for High Sensitivity Photoresists Having Autodecomposition Temperatures > 160°
Author(s): W. Brunsvold; W. Conley; D. Crockatt; N. Iwamoto
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Paper Abstract

There are particular polymeric materials having acid labile groups pendant to the polymer backbone which can be used to produce resist structures having autodecomposition temperatures greater than 160°C. The increase in autodecomposition temperature of the resist is achieved by selecting acid labile groups which upon acid catalyzed deprotection generate less stable intermediate carbonium ions than the t-butyl carbonium ion. Acid labile groups that provide increased autodecomposition stability include those capable of forming secondary aliphatic and deactivated secondary benzylic carbonium ion intermediates. There must be a hydrogen on a carbon adjacent to the carbonium ion in order for elimination of an alkene and a proton to occur and continue the chemical amplification process. The acid labile pendant groups can be part of a polystyrene homopolymer or part of copolymers containing styrene and maleimide units.

Paper Details

Date Published: 30 January 1989
PDF: 6 pages
Proc. SPIE 1086, Advances in Resist Technology and Processing VI, (30 January 1989); doi: 10.1117/12.953048
Show Author Affiliations
W. Brunsvold, IBM-E. Fishkill (United States)
W. Conley, IBM-E. Fishkill (United States)
D. Crockatt, IBM-E. Fishkill (United States)
N. Iwamoto, Optical Data, Inc. (United States)


Published in SPIE Proceedings Vol. 1086:
Advances in Resist Technology and Processing VI
Elsa Reichmanis, Editor(s)

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