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Proceedings Paper

Evaporated Fatty Acid Resist Process
Author(s): Hisato Kato; Shinzo Morita; Masahiro Tawata; Shuzo Hattori
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Paper Abstract

Double layer resist process using fatty acid and Al was proposed for fine pattern fabrication. Oriented thin films of stearic acid and w-tricosenoic acid were formed on an Al evaporated substrate by evaporation using a furnace with an orifice of a few mm diameter. Electron beam exposure characteristics of the films were studied and 2um L/S pattern was successfully developed by heating the substrate and C12 etching of Al.

Paper Details

Date Published: 30 January 1989
PDF: 4 pages
Proc. SPIE 1086, Advances in Resist Technology and Processing VI, (30 January 1989); doi: 10.1117/12.953035
Show Author Affiliations
Hisato Kato, Nagoya Univ. (Japan)
Shinzo Morita, Nagoya Univ. (Japan)
Masahiro Tawata, Meijo Univ. (Japan)
Shuzo Hattori, Nagoya Univ. (Japan)


Published in SPIE Proceedings Vol. 1086:
Advances in Resist Technology and Processing VI
Elsa Reichmanis, Editor(s)

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