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Proceedings Paper

Development of standalone coherent EUV scatterometry microscope with high-harmonic-generation EUV source
Author(s): Tetsuo Harada; Masato Nakasuji; Takeo Watanabe; Yutaka Nagata; Hiroo Kinoshita
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Paper Abstract

For extreme ultraviolet (EUV) mask evaluation, we have developed the coherent EUV scatterometry microscope (CSM), which is equipped with a laboratory coherent EUV source for high-harmonic generation (HHG) and acts as a standalone EUV tool. The CSM records the diffraction from mask patterns directly with a charge-coupled-device (CCD) camera, which was illuminated with the coherent EUV light. The pattern image and the critical dimension values are evaluated by using the diffraction image with iterative calculations based on coherent diffraction imaging. The 59th high-order harmonic generation at a wavelength of 13.5 nm was pumped by a tabletop 6 mJ, 32 fs, Ti:sapphire laser system. EUV output energy of 1 μW was successfully achieved. We observed the EUV mask using the HHG-CSM system. A very small 2 nm-wide line defect was successfully detected while located in an 88 nm line-and-space pattern.

Paper Details

Date Published: 30 June 2012
PDF: 10 pages
Proc. SPIE 8441, Photomask and Next-Generation Lithography Mask Technology XIX, 84411I (30 June 2012); doi: 10.1117/12.952477
Show Author Affiliations
Tetsuo Harada, Univ. of Hyogo (Japan)
Japan Science and Technology Agency (Japan)
Masato Nakasuji, Univ. of Hyogo (Japan)
Japan Science and Technology Agency (Japan)
Takeo Watanabe, Univ. of Hyogo (Japan)
Japan Science and Technology Agency (Japan)
Yutaka Nagata, RIKEN (Japan)
Japan Science and Technology Agency (Japan)
Hiroo Kinoshita, Univ. of Hyogo (Japan)
Japan Science and Technology Agency (Japan)


Published in SPIE Proceedings Vol. 8441:
Photomask and Next-Generation Lithography Mask Technology XIX
Kokoro Kato, Editor(s)

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