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Proceedings Paper

Photoelectrochemical Etching Of Holographic Gratings In Semiconductors And Applications
Author(s): J. Ph. Schnell; V. Martin; P. Nyeki; B. Loiseaux; G. Illiaquer; J. P. Huignard
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Paper Abstract

We describe and analyse the use of the photoelectrochemical etching technique to create holographic relief gratings and patterns in semiconductors such as GaAs. Images and wavefront diffracted in the visible and the I.R. will be shown.

Paper Details

Date Published: 30 June 1986
PDF: 5 pages
Proc. SPIE 0600, Progress in Holographic Applications, (30 June 1986); doi: 10.1117/12.952420
Show Author Affiliations
J. Ph. Schnell, Thomson-CSF (France)
V. Martin, Thomson-CSF (France)
P. Nyeki, Thomson-CSF (France)
B. Loiseaux, Thomson-CSF (France)
G. Illiaquer, Thomson-CSF (France)
J. P. Huignard, Thomson-CSF (France)

Published in SPIE Proceedings Vol. 0600:
Progress in Holographic Applications
Jean P. L. Ebbeni, Editor(s)

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