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Proceedings Paper

Multiple Phase Level Computer-Generated Holograms Etched In Fused Silica
Author(s): Kevin M. Flood; J. Michael Finlan; Richard J. Bojko
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Paper Abstract

We present a new approach for fabricating multiple phase level holographic optical elements in fused silica. The approach utilizes electron-beam lithography, and it is particularly applicable for devices with minimum feature sizes below 1 μm. We have succeeded in fabricating arrays of multiple phase level optical elements with minimum features of 0.4 μm. We also report on the diffraction efficiencies of cylindrical f/1 lenses with 3 mm focal lengths. The results agree very well with the theoretical predictions. We also predict that an increase in diffraction efficiency of as much as 10 % can be realized from the outer portions of a holographic lens through better registration of the multiple layers.

Paper Details

Date Published: 6 May 1989
PDF: 6 pages
Proc. SPIE 1052, Holographic Optics: Optically and Computer Generated, (6 May 1989); doi: 10.1117/12.951491
Show Author Affiliations
Kevin M. Flood, GE Astro-Space Division (United States)
J. Michael Finlan, GE Astro-Space Division (United States)
Richard J. Bojko, Cornell University (United States)


Published in SPIE Proceedings Vol. 1052:
Holographic Optics: Optically and Computer Generated
Ivan Cindrich; Sing H. Lee, Editor(s)

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