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Proceedings Paper

General Approaches To Mask Design For Binary Optics
Author(s): James Logue; Marilynn L. Chisholm
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Paper Abstract

The fabrication of binary optics using high quality lithographic processes requires binary masks with constant phase contours. Parameter driven software for the development of these masks has been developed at Perkin-Elmer. Applications include zone plates, aspheric lenses, and optics described using Zernike polynomials, arbitrary phase functions, and sampled phase arrays.

Paper Details

Date Published: 6 May 1989
PDF: 6 pages
Proc. SPIE 1052, Holographic Optics: Optically and Computer Generated, (6 May 1989); doi: 10.1117/12.951482
Show Author Affiliations
James Logue, Perkin-Elmer Corporation (United States)
Marilynn L. Chisholm, Perkin-Elmer Corporation (United States)

Published in SPIE Proceedings Vol. 1052:
Holographic Optics: Optically and Computer Generated
Ivan Cindrich; Sing H. Lee, Editor(s)

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