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Proceedings Paper

Direct Ray Field And Intensity Calculation In Lens Systems And Its Application To Flare And Ghost Reduction
Author(s): Stuart A. Collins; Eric D. Evans
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Paper Abstract

This paper deals with the calculation of intensity associated with rays in optical systems. A new set of equations is derived using optical field techniques which gives the electromagnetic fields, including intensity and polarization, around an arbitrary skew base ray. These equations are then used to calculate the flare and ghost light reflected from lens surfaces. An example is given showing flare light and its reduction in several patented lenses using this approach. The system of equations is derived using a parabasal approach in which one uses a small angle spherical or elliptical wave expansion about a base ray which is propagating at an arbitrary angle. These are manipulated to give field transfer equations. The field expressions are matched at lens surfaces to give field refraction equations. The result is a set of equations for transferring complete electromagnetic field information through an optical system. The equations thus derived are applied to the minimization of scattered light in optical systems. They are incorporated in an optimizing lens design program. An additional term is included in the merit function of the program so that the lens can be redesigned to minimize flare and ghost light at the image plane. The equations will be presented along with the application to flare light minimization.

Paper Details

Date Published: 13 June 1989
PDF: 17 pages
Proc. SPIE 1049, Recent Trends in Optical Systems Design and Computer Lens Design Workshop II, (13 June 1989); doi: 10.1117/12.951417
Show Author Affiliations
Stuart A. Collins, The Ohio State University ElectroScience Laboratory (United States)
Eric D. Evans, The Ohio State University ElectroScience Laboratory (United States)

Published in SPIE Proceedings Vol. 1049:
Recent Trends in Optical Systems Design and Computer Lens Design Workshop II
Robert E. Fischer; Richard C. Juergens, Editor(s)

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