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Proceedings Paper

High Index Of Refraction Films For Dielectric Mirrors Prepared By Metal-Organic Chemical Vapor Deposition
Author(s): Raymond M. Brusasco
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Paper Abstract

A wide variety of metal oxides with high index of refraction can be prepared by Metal-Organic Chemical Vapor Deposition. We present some recent optical and laser damage results on oxide films prepared by MOCVD which could be used in a multilayer structure for highly reflecting (HR) dielectric mirror applications. The method of preparation affects both optical properties and laser damage threshold.

Paper Details

Date Published: 11 July 1989
PDF: 10 pages
Proc. SPIE 1047, Mirrors and Windows for High Power/High Energy Laser Systems, (11 July 1989); doi: 10.1117/12.951349
Show Author Affiliations
Raymond M. Brusasco, University of California (United States)

Published in SPIE Proceedings Vol. 1047:
Mirrors and Windows for High Power/High Energy Laser Systems
Claude A. Klein, Editor(s)

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