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Proceedings Paper

A New Process For Manufacturing Arrays Of Microlenses
Author(s): N. P. Eisenberg; A. Karsenty; J. Broder; M. Abitbol; N.Ben Yossef
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Paper Abstract

The need for microlenses with a wide-range of focal lengths from 10μ to 100mm and with a diameter varying from 10μ to 1mm lead to the development of various techniques which are able to generate these lenses in a photoresist substrate. The existing techniques are reviewed and a new one proposed. In this technique a positive or negative photoresist layer is exposed to a tailored light intensity distribution. After development of the photoresist, its surface is identical to the spatial intensity light distribution. Photoresist with an index of refraction of n=1.6 in the visible spectrum, can be used as a lens.

Paper Details

Date Published: 5 July 1989
PDF: 12 pages
Proc. SPIE 1038, 6th Mtg in Israel on Optical Engineering, (5 July 1989); doi: 10.1117/12.951075
Show Author Affiliations
N. P. Eisenberg, Jerusalem College of Technology (Israel)
A. Karsenty, Jerusalem College of Technology (Israel)
J. Broder, Jerusalem College of Technology (Israel)
M. Abitbol, Hebrew University of Jerusalem (Israel)
N.Ben Yossef, Hebrew University of Jerusalem (Israel)


Published in SPIE Proceedings Vol. 1038:
6th Mtg in Israel on Optical Engineering
Rami Finkler; Joseph Shamir, Editor(s)

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