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Proceedings Paper

Use Of Thermal Nitridation To Fabricate Low Loss Planar Optical Waveguides In Si0[sub]2[/sub]
Author(s): David E. Zelmon; Howard E. Jackson; Joseph T. Boyd
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Paper Abstract

Low loss planar optical waveguides have been fabricated by thermal nitridation of thick silicon dioxide films. The waveguides were formed by oxidizing silicon wafers at 1100°C in steam and then exposing them to an atmosphere of electronic grade ammonia for periods between one and ten days. Measurements of waveguide loss, effective refractive index and refractive index were performed as functions of nitridation time. Losses for these waveguides ranged between 0.06 and 0.31 dB/cm. Auger electron spectroscopy and ellipsometry were used to characterize the nitrided films. The waveguide loss data were compared with calculations of optical waveguide properties.

Paper Details

Date Published: 11 September 1985
PDF: 3 pages
Proc. SPIE 0578, Integrated Optical Circuit Engineering II, (11 September 1985); doi: 10.1117/12.950754
Show Author Affiliations
David E. Zelmon, University of Cincinnati (United States)
Howard E. Jackson, University of Cincinnati (United States)
Joseph T. Boyd, University of Cincinnati (United States)


Published in SPIE Proceedings Vol. 0578:
Integrated Optical Circuit Engineering II
Sriram Sriram, Editor(s)

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