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Proceedings Paper

Plasma Deposition Of Integrated Optical Waveguides
Author(s): N Nourshargh; E M Starr; J S McCormack
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Paper Abstract

A plasma activated chemical vapour deposition (CVD) technique is described for fabricating doped silica optical waveguides on silica substrates. Planar, germania doped, silica waveguides have been fabricated with less than 0.3 dB/cm attenuation at λ = 0.633 μm. There is considerable scope for reducing the attenuation much further. Waveguide depositions are normally carried out at 1100°C but guiding films have also been deposited at room temperature.

Paper Details

Date Published: 11 September 1985
PDF: 5 pages
Proc. SPIE 0578, Integrated Optical Circuit Engineering II, (11 September 1985); doi: 10.1117/12.950753
Show Author Affiliations
N Nourshargh, GEC Research Limited (England)
E M Starr, GEC Research Limited (England)
J S McCormack, GEC Research Limited (England)


Published in SPIE Proceedings Vol. 0578:
Integrated Optical Circuit Engineering II
Sriram Sriram, Editor(s)

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