Proceedings PaperMicrostructure And Patterning Of Laser Initiated Oxide Growth
|Format||Member Price||Non-Member Price|
|GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free.||Check Access|
Microstructural studies of silicon dioxide films grown by laser and by traditional means using infrared spectrometry are described. Broad similarities and intriguing thickness dependences are discussed. A new technique of Direct Growth Lithography (DGL) is reported, whereby oxide patterns are selectively and directly grown over significant regions of a silicon wafer, with spatial features extending over a 3mm square area with linewidths down to around one micron.