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Proceedings Paper

Gas Phase UV Photochemistry Of NF[sub]2[/sub] Dynamics And Kinetics Of NF(X3E) And NF(A1A) Radical Products And Direct Measurement Of The H + NF2 Reaction Branching Ratio
Author(s): H. Helvajian; R. F. Heidner; J. S. Holloway; J. B. Koffend
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Paper Abstract

In a series of experiments we have investigated the NF2 UV photolysis product distributions, the kinetics of those products, and the reaction of the parent NF2 with atomic hydrogen. Our experiment utilizes a teflon coated photolysis chamber which can be heated (420 K) and in which we flow the reagent tetrafluorohydrazine (N2F4: 10% mixture in Ar). At the photolysis cell temperature, the N2F4 pyrolyzes (98%) to form 2NF2. An excimer laser (248 nm, 193 nm) or a tunable UV laser (frequency up converted Nd-Yag pumped dye laser) is used as the photolysis source. The Nd-Yag pumped dye laser in the visible also serves as a pump in the laser-induced fluorescence (LIF) studies of NF(X3∑). Two PMT's, are simultaneously used to detect the LIF from NF(X3∑) and fluorescence emission from NF(a1Δ). This capability allows us to simultaneously monitor both ground and excited state products following laser photolysis. Two computers are necessary for the experiment. The first monitors the LIF signal as a function of delay time between photolysis and probe laser, both laser energies, and the probe laser wavelength. The second computer is used to acquire data of the fluorescence emission as digitized by a fast transient recorder. We also monitor all gas mass flow meters, the cell temperature, and pressure.

Paper Details

Date Published: 20 June 1989
PDF: 2 pages
Proc. SPIE 1031, 7th Intl Symp on Gas Flow and Chemical Lasers, (20 June 1989); doi: 10.1117/12.950588
Show Author Affiliations
H. Helvajian, The Aerospace Corporation (United States)
R. F. Heidner, The Aerospace Corporation (United States)
J. S. Holloway, The Aerospace Corporation (United States)
J. B. Koffend, The Aerospace Corporation (United States)

Published in SPIE Proceedings Vol. 1031:
7th Intl Symp on Gas Flow and Chemical Lasers
Dieter Schuoecker, Editor(s)

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