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Proceedings Paper

Shearing Photoelasticity
Author(s): Wang RuDeng; He Wei; Chen Shiming
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Paper Abstract

The physical conception of the shearing photoelasticity is presented. The mathematic model is found and the deduction of the shearing photoelasticity equation is given. In order to improve the sensitivity of the shearing photoelasticity, a new method is developed that is the carried mismatch method by virtue of the computer. Some interesting results are obtained.

Paper Details

Date Published: 31 March 1989
PDF: 3 pages
Proc. SPIE 1026, Holography Techniques and Applications, (31 March 1989); doi: 10.1117/12.950247
Show Author Affiliations
Wang RuDeng, Shanghai College of Architectural and Municipal Engineering (China)
He Wei, Shanghai College of Architectural and Municipal Engineering (China)
Chen Shiming, Shanghai College of Architectural and Municipal Engineering (China)


Published in SPIE Proceedings Vol. 1026:
Holography Techniques and Applications
Werner P. O. Jueptner, Editor(s)

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