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Proceedings Paper

Kinetics Of Laser-Assisted Oxidation Of Metallic Films
Author(s): P. Quenon; O. Toubeau; M. Wautelet
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Paper Abstract

Oxidation of thin metallic films on glass substrates exposed to cw Ar+ laser irradiation is studied. The evolution of the oxide thickness, x, with time, t, is measured via the reflectivity of a probed He-Ne laser beam. Under certain conditions, the temperature of the irradiated zone is measured via the reflectivity of the glass substrate. Therefore, the x(t) and dx(T)/dt are deduced. This permits to obtain a much better kinetics of oxidation than for previous works, where oxidation rates were measured from the positions of the minima and maxima of reflectivity. Evidence for a temperature threshold for laser-assisted oxidation of vanadium film is obtained. This threshold is independent on laser fluence.

Paper Details

Date Published: 10 April 1989
PDF: 4 pages
Proc. SPIE 1022, Laser Assisted Processing, (10 April 1989); doi: 10.1117/12.950116
Show Author Affiliations
P. Quenon, Universite de l'Etat (Belgium)
O. Toubeau, Universite de l'Etat (Belgium)
M. Wautelet, Universite de l'Etat (Belgium)


Published in SPIE Proceedings Vol. 1022:
Laser Assisted Processing
Lucien Diego Laude; Gerhard K. Rauscher, Editor(s)

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