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Proceedings Paper

Impedance Matching Of Rf-Excited CO[sub]2[/sub]-Lasers
Author(s): Bruno Walter
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Paper Abstract

The rf-excitation technique bases on the application of a sinusoidal voltage in the regime above 10 MHz to obtain a glow discharge. Specific requirements are necessary to ensure an efficient and reflection free power transmission from the generator to the load. In case of power matching the maximum power transmission is obtained, whereas impedance matching avoids reflection of the incident rf-power which would cause a standing wave at the line. Two or three element lumped circuits are sufficient to match the impedance of an rf-plasma to the characteristic impedance of the transmission line. In our case the eight laser discharge sections were driven by their own generators, each connected by a 50 Ω transmission line and a Collins filter. This Collins filter ensures an ideal matching for the total range of input power so that the total incident rf-power is utilized in the plasma.

Paper Details

Date Published: 24 March 1989
PDF: 13 pages
Proc. SPIE 1020, High Power CO2 Laser Systems and Applications, (24 March 1989); doi: 10.1117/12.950050
Show Author Affiliations
Bruno Walter, Technical University Vienna (Austria)

Published in SPIE Proceedings Vol. 1020:
High Power CO2 Laser Systems and Applications
A. Quenzer, Editor(s)

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