Share Email Print

Proceedings Paper

The Use Of Molecular Beam Techniques For The Fabrication Of Optical Thin Films And Structures
Author(s): I T Muirhead; K L Lewis; A M Pitt; A G Cullis; T J Wyatt-Davies; G Williams; A Miller
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Molecular Beam and Ultra-High Vacuum techniques have been applied to the deposition of optical thin films and structures. Materials studied include ZnSe, ZnS, BaF2 and PbF2. Properties of microstructure and crystallite size have been studied using cross sectional TEM techniques. MBE techniques enable the production of novel thin film structures such as Bragg reflectors and graded index anti-reflection coatings. Etalon filters fabricated using this method show consierably improved long term operating stability over those produced by conventional evaporation.

Paper Details

Date Published: 27 February 1989
PDF: 8 pages
Proc. SPIE 1019, Thin Film Technologies III, (27 February 1989); doi: 10.1117/12.950037
Show Author Affiliations
I T Muirhead, OCLI Optical Coatings Ltd (Scotland)
K L Lewis, Royal Signals and Radar Establishment (UK)
A M Pitt, Royal Signals and Radar Establishment (UK)
A G Cullis, Royal Signals and Radar Establishment (UK)
T J Wyatt-Davies, Royal Signals and Radar Establishment (UK)
G Williams, Royal Signals and Radar Establishment (UK)
A Miller, Royal Signals and Radar Establishment (UK)

Published in SPIE Proceedings Vol. 1019:
Thin Film Technologies III
Karl H. Guenther; Hans K. Pulker, Editor(s)

© SPIE. Terms of Use
Back to Top