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Proceedings Paper

Magnetron Sputtering Deposition Of Ultrathin W-Si Multilayers For X Rays Optics
Author(s): B. Vidal; J. Marfaing; P. Dhez
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Paper Abstract

New magnetic materials and X Ray mirrors lead to prepare multilayered structures (M.L.S.) with the thinnest periodic layers. However physical limitations appear for periods below some tens of Å. In particular, tolerances of realization are critical relatively to ultrathin thicknesses values. In sputtering, the deposition rate is easily reproducible, and can be maintained at a constant and low value during severals hours; for these reasons we are able to perform a large number (more than one hundred) of periodic ultrathin layers by this system (3 to 1.5 nm). High Resolution Transmission Electron Microscopy (H.R.T.E.M.) and X Ray reflectivity measurements are used to compare interfaces and stacking regularities for sample with 140 layers. The W/Si M.L.S. present a best quality, as for interfaces and structures, compared to the W/C M.L.S.

Paper Details

Date Published: 27 February 1989
PDF: 6 pages
Proc. SPIE 1019, Thin Film Technologies III, (27 February 1989); doi: 10.1117/12.950030
Show Author Affiliations
B. Vidal, Universite d'Aix-Mraseille III (France)
J. Marfaing, Faculte des Sciences de Luminy (France)
P. Dhez, Universite de Paris-Sud (France)


Published in SPIE Proceedings Vol. 1019:
Thin Film Technologies III
Karl H. Guenther; Hans K. Pulker, Editor(s)

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