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Proceedings Paper

Modern Optical Coating Technologies
Author(s): Hans K. Pulker
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Paper Abstract

Highest quality dielectric films are required today for various interference optical applications and for planar wave guides in integrated optics. Many inorganic chemical compounds which were difficult to deposit by conventional techniques in form of well adherent, dense, hard and stable low-loss films are now routinly synthesized by reactive gas discharge plasma and energetic ion and/or coating materials atom processes. A survey over such PVD coating technologies and on the resulting film properties is given in this paper.

Paper Details

Date Published: 27 February 1989
PDF: 10 pages
Proc. SPIE 1019, Thin Film Technologies III, (27 February 1989); doi: 10.1117/12.950029
Show Author Affiliations
Hans K. Pulker, BALZERS AG (Liechtenstein)


Published in SPIE Proceedings Vol. 1019:
Thin Film Technologies III
Karl H. Guenther; Hans K. Pulker, Editor(s)

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