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Proceedings Paper

Optical Thickness Monitoring Of Dielectric Optical Filters Using A New In-Situ Photometer With High Signal Resolution And Excellent Long-Term-Stability
Author(s): Alfons Zoller; Michael Boos; Reinhard Herrmann; Werner Klug; Walter Lehnert
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Paper Abstract

We will describe the concept and operation principle of the newly developed monochromatic process photometer OMS 3000 for optical coating systems. It is designed as a true double beam instrument, completely controlled by modern microprocessor techniques. It offers high signal resolution and excellent long-term stability. The deposition of complicated layer systems is supported by an advanced monitoring software which precalculates the cut-off conditions. In addition, spectral measurements between layers are possible allowing the on-line-optimization via an external host computer.

Paper Details

Date Published: 27 February 1989
PDF: 8 pages
Proc. SPIE 1019, Thin Film Technologies III, (27 February 1989); doi: 10.1117/12.950024
Show Author Affiliations
Alfons Zoller, LEYBOLD Aktiengesellschaft (FRG)
Michael Boos, LEYBOLD Aktiengesel (FRG)
Reinhard Herrmann, LEYBOLD Aktiengesellschaft (FRG)
Werner Klug, LEYBOLD Aktienaesellschaft (FRG)
Walter Lehnert, LEYBOLD Aktiengesellschaft (FRG)

Published in SPIE Proceedings Vol. 1019:
Thin Film Technologies III
Karl H. Guenther; Hans K. Pulker, Editor(s)

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