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Proceedings Paper

In-Situ Optical Monitoring Of Thin Films During Evaporation
Author(s): M. T. Gale; H. W Lehmann; H. Brunner; K. Frick
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Paper Abstract

An optical monitoring system for the in-situ reflectivity measurement on the actual moving substrates during e-beam thin film batch deposition is described. The reflectivity of one of the substrates mounted on the caroussel and moving in a planetary motion during the deposition is measured at 2 laser wavelengths (HeNe green and red) and compared with computed curves to determine the end-points. Examples of deposited TiO2 films and a multi-layer dielectric mirror are given.

Paper Details

Date Published: 27 February 1989
PDF: 6 pages
Proc. SPIE 1019, Thin Film Technologies III, (27 February 1989); doi: 10.1117/12.950022
Show Author Affiliations
M. T. Gale, Paul Scherrer Institute c/o Laboratories RCA Ltd. (Switzerland)
H. W Lehmann, Paul Scherrer Institute c/o Laboratories RCA Ltd. (Switzerland)
H. Brunner, Paul Scherrer Institute c/o Laboratories RCA Ltd. (Switzerland)
K. Frick, Gretag Aktiengesellschaft (Switzerland)


Published in SPIE Proceedings Vol. 1019:
Thin Film Technologies III
Karl H. Guenther; Hans K. Pulker, Editor(s)

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