Share Email Print
cover

Proceedings Paper

In-Situ Optical Monitoring Of Thin Films During Evaporation
Author(s): M. T. Gale; H. W Lehmann; H. Brunner; K. Frick
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

An optical monitoring system for the in-situ reflectivity measurement on the actual moving substrates during e-beam thin film batch deposition is described. The reflectivity of one of the substrates mounted on the caroussel and moving in a planetary motion during the deposition is measured at 2 laser wavelengths (HeNe green and red) and compared with computed curves to determine the end-points. Examples of deposited TiO2 films and a multi-layer dielectric mirror are given.

Paper Details

Date Published: 27 February 1989
PDF: 6 pages
Proc. SPIE 1019, Thin Film Technologies III, (27 February 1989); doi: 10.1117/12.950022
Show Author Affiliations
M. T. Gale, Paul Scherrer Institute c/o Laboratories RCA Ltd. (Switzerland)
H. W Lehmann, Paul Scherrer Institute c/o Laboratories RCA Ltd. (Switzerland)
H. Brunner, Paul Scherrer Institute c/o Laboratories RCA Ltd. (Switzerland)
K. Frick, Gretag Aktiengesellschaft (Switzerland)


Published in SPIE Proceedings Vol. 1019:
Thin Film Technologies III
Karl H. Guenther; Hans K. Pulker, Editor(s)

© SPIE. Terms of Use
Back to Top