Share Email Print

Proceedings Paper

Microstructure Analysis Of Thin Films Deposited By Reactive Evaporation And By Reactive Ion-Plating
Author(s): Karl H. Guenther; Boon Loo; David Burns; Jo Edgell; Debbie Windham; Karl-Heinz Muller
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Electron microscopy, stylus-type surface profilometry, and Raman microprobe characteri-zation show distinct differences between thin films deposited by reactive evaporation and by reactive ion plating. Reactive evaporation yields thin films with the well-known columnar microstructure with appreciable surface roughness and other deficiencies. Low-voltage, high-current reactive ion plating deposition produces thin films which are smooth and dense. Cross-section electron micrographs of ion plated coatings reveal a densely packed poly-crystalline structure for Zr09, while TiO2 appears to form vitreous films. Molecular dynamics computer simulation of the film formation process is in good qualitative agreement with the experiments. The results suggest the expansion of the Movchan-Demchishin structure zone model with an additional Zone 4 for the vitreous phase, resulting from superthermal film formation conditions (thermal spiking).

Paper Details

Date Published: 27 February 1989
PDF: 11 pages
Proc. SPIE 1019, Thin Film Technologies III, (27 February 1989); doi: 10.1117/12.950020
Show Author Affiliations
Karl H. Guenther, University of Central Florida (United States)
Boon Loo, University of Alabama (United States)
David Burns, University of Alabama (United States)
Jo Edgell, University of Alabama (United States)
Debbie Windham, University of Alabama (United States)
Karl-Heinz Muller, CSIRO Division of Applied Physics (Australia)

Published in SPIE Proceedings Vol. 1019:
Thin Film Technologies III
Karl H. Guenther; Hans K. Pulker, Editor(s)

© SPIE. Terms of Use
Back to Top