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Proceedings Paper

Computer Controlled E-Beam CC-CD System
Author(s): Donald J. Evins; Stewart Spiers
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Paper Abstract

VLSI and ULSI developments aimed at sub-micron geometries require improved measuring systems. A computer controlled cassette to cassette electron beam system has been developed. High resolution of l5nm at lkV is routinely achieved with a unique 4 lens electron optical system. Through-put of the system is 10-15 wafers per hour (5 chips, 1 measurement/chip). An automatic line width measurement method with high accuracy, "The Linear Regression Method"1, has achieved an absolute accuracy of 0.009μm.

Paper Details

Date Published: 2 January 1986
PDF: 5 pages
Proc. SPIE 0565, Micron and Submicron Integrated Circuit Metrology, (2 January 1986); doi: 10.1117/12.949754
Show Author Affiliations
Donald J. Evins, International Scientific Instruments, Inc. (United States)
Stewart Spiers, International Scientific Instruments, Inc. (United States)


Published in SPIE Proceedings Vol. 0565:
Micron and Submicron Integrated Circuit Metrology
Kevin M. Monahan, Editor(s)

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