Share Email Print
cover

Proceedings Paper

Computer Controlled E-Beam CC-CD System
Author(s): Donald J. Evins; Stewart Spiers
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

VLSI and ULSI developments aimed at sub-micron geometries require improved measuring systems. A computer controlled cassette to cassette electron beam system has been developed. High resolution of l5nm at lkV is routinely achieved with a unique 4 lens electron optical system. Through-put of the system is 10-15 wafers per hour (5 chips, 1 measurement/chip). An automatic line width measurement method with high accuracy, "The Linear Regression Method"1, has achieved an absolute accuracy of 0.009μm.

Paper Details

Date Published: 2 January 1986
PDF: 5 pages
Proc. SPIE 0565, Micron and Submicron Integrated Circuit Metrology, (2 January 1986); doi: 10.1117/12.949754
Show Author Affiliations
Donald J. Evins, International Scientific Instruments, Inc. (United States)
Stewart Spiers, International Scientific Instruments, Inc. (United States)


Published in SPIE Proceedings Vol. 0565:
Micron and Submicron Integrated Circuit Metrology
Kevin M. Monahan, Editor(s)

© SPIE. Terms of Use
Back to Top