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Proceedings Paper

Hitachi S-6000 Field Emission CD-Measurement SEM
Author(s): T. Ohtaka; S. Saito; T. Furuya; O. Yamada
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Paper Abstract

We have developed the Model S-6000 for critical dimension measurement of circuit patterns on VLSI wafers utilizing a filed emission electron source. This instrument has been designed to handle up to a 6" wafer. Measurements are made under low voltage operation, at a high resolving power and at a flicker-free TV-scan rate. Minimum dose feature protects the wafer under measurement from electron beam damage. The S-6000 is a state-of-the-art CD measurement, SEM for quality control of in-process wafers.

Paper Details

Date Published: 2 January 1986
PDF: 4 pages
Proc. SPIE 0565, Micron and Submicron Integrated Circuit Metrology, (2 January 1986); doi: 10.1117/12.949752
Show Author Affiliations
T. Ohtaka, Hitachi Limited (Japan)
S. Saito, Hitachi Limited (Japan)
T. Furuya, Hitachi Limited (Japan)
O. Yamada, Hitachi Limited (Japan)


Published in SPIE Proceedings Vol. 0565:
Micron and Submicron Integrated Circuit Metrology
Kevin M. Monahan, Editor(s)

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