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Proceedings Paper

Edge Recognition in SEM Metrology
Author(s): J. F. Mancuso; S. Erasmus
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Paper Abstract

Minimum linewidths of integrated circuits in mass production are currently (1985) just above lum. They are projected to decrease to 0.7um and then to 0.5um in the next decade. Linewidths currently must be controlled to ±10% and it is predicted that linewidth control may need to be ±5% in the future. To reach present goals, linewidth measurement systems with accuracies of at least 10% of linewidth (3 sigma) and, in some cases, ±5% (3 sigma) are required. Errors less than 0.05 to 0.lum (3 sigma) on lum lines and 0.025 to 0.05μm (3 sigma) on 0.5μm lines are therefore needed. This precision must be maintained over long time periods, with different operators and when thicknesses, profiles and other parameters of the structures change due to normal process variations.

Paper Details

Date Published: 2 January 1986
PDF: 9 pages
Proc. SPIE 0565, Micron and Submicron Integrated Circuit Metrology, (2 January 1986); doi: 10.1117/12.949751
Show Author Affiliations
J. F. Mancuso, JEOL U.S.A. , INC. (United States)
S. Erasmus, Hewlett Packard Laboratories (United States)


Published in SPIE Proceedings Vol. 0565:
Micron and Submicron Integrated Circuit Metrology
Kevin M. Monahan, Editor(s)

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