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Proceedings Paper

Precise Measurements In A Scanning Electron Microscope
Author(s): Tyler North
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Paper Abstract

As the latest integrated circuit designs move toward submicron feature dimensions, optical microscopes commmonly used for critical dimension (CD) measurements no longer have sufficient resolution. 1,2 Just as the semiconductor industry has turned to electron beam lithography for mask making and direct writing to achieve submicron dimensions in VLSI and VHSIC devices, so too must it turn to electron beam instruments to measure these devices. A computer based system for digitally controlling a scanning electron microscope (SEM) is described and its ability to provide precise, accurate measurements evaluated.

Paper Details

Date Published: 2 January 1986
PDF: 9 pages
Proc. SPIE 0565, Micron and Submicron Integrated Circuit Metrology, (2 January 1986); doi: 10.1117/12.949750
Show Author Affiliations
Tyler North, Tracor Northern (United States)


Published in SPIE Proceedings Vol. 0565:
Micron and Submicron Integrated Circuit Metrology
Kevin M. Monahan, Editor(s)

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