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Proceedings Paper

SEM-based System For Calibration Of Linewidth SRMs For The IC industry
Author(s): D. Nyyssonen; M. T. Postek
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Paper Abstract

The National Bureau of Standards is currently developing a new scanning electron microscope-based linewidth measurement system for future calibration of standard reference materials for the IC industry. This system incorporates a piezo/interferometric stage for precise translational motion and the monitoring of distance, improved vibration-isolation, microprocessor stage control system, and computer data analysis. The specifications incorporated into the system are designed for the measurement of linewidth dimensions from 0.1 to 2 μm with a precision of 0.002 μm. The design philosophy of the system is discussed along with the current limitations of accurate edge detection in SEM-based systems.

Paper Details

Date Published: 2 January 1986
PDF: 7 pages
Proc. SPIE 0565, Micron and Submicron Integrated Circuit Metrology, (2 January 1986); doi: 10.1117/12.949749
Show Author Affiliations
D. Nyyssonen, National Bureau of Standards (United States)
M. T. Postek, National Bureau of Standards (United States)


Published in SPIE Proceedings Vol. 0565:
Micron and Submicron Integrated Circuit Metrology
Kevin M. Monahan, Editor(s)

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