Share Email Print

Proceedings Paper

Precision Wafer-Stepper Alignment And Metrology Using Diffraction Gratings And Laser Interferometry
Author(s): S. Wittekoek; H. Linders; H. Stover; G. Johnson; D. Gallagher; R. Fergusson
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

This article briefly reviews the unique features of the ASM Lithography wafer stepper that make it extremely well suited for precision metrology applications, and presents techniques and procedures developed for use in wafer-stepper manufacture (i.e., final assembly, final test, quality assurance, and field service). The procedures lead to unprecedented tight tolerances on some machine specifications, and to settings of maximum latitude for some other machine specifications. It is believed that these developments and other similar procedures will become requirements in machine manufacturing as the current trends in IC chip production continue to unfold (i.e., machine matching, tighter overlay design rules, larger exposure fields, larger wafers, etc.)

Paper Details

Date Published: 2 January 1986
PDF: 10 pages
Proc. SPIE 0565, Micron and Submicron Integrated Circuit Metrology, (2 January 1986); doi: 10.1117/12.949728
Show Author Affiliations
S. Wittekoek, ASM Lithography (The Netherlands)
H. Linders, ASM Lithography (The Netherlands)
H. Stover, ASM Lithography (The Netherlands)
G. Johnson, ASM Lithography, Inc. (United States)
D. Gallagher, ASM Lithography, Inc. (United States)
R. Fergusson, ASM Lithography, Inc. (United States)

Published in SPIE Proceedings Vol. 0565:
Micron and Submicron Integrated Circuit Metrology
Kevin M. Monahan, Editor(s)

© SPIE. Terms of Use
Back to Top