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Proceedings Paper

The Development of Single and Multilayered Wolter X-ray Microscopes
Author(s): A. Franks; B. Gale
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Paper Abstract

Scanning Wolter X-ray microscopes having resolutions of at least 0.1 pm at wavelengths down to 0.15 nm are being developed. The initial objective of the work is to produce a microscope mirror substrate which will be evaluated and used at 4 nm as a non-multilayered microscope. It will have virtually the same geometry as the mirror which will subsequently be used in multilayered form at much shorter wavelengths. The problems of substrate manufacture to the required tolerances together with the development of the associated specialised metrological instrumentation will be similar for both microscopes. A theoretical study has been undertaken in which the images produced by multilayered mirror systems are calculated by ray tracing, using geometrical diffraction optics and the Debye approximation. Each element of the wavefront is described by a ray carrying the field vectors. An optimisation procedure for calculating the layer structure has been derived. For maximum flux throughput, the variation of the layer structure and roughness must be controlled to about 0.1 nm.

Paper Details

Date Published: 6 May 1985
PDF: 9 pages
Proc. SPIE 0563, Applications of Thin Film Multilayered Structures to Figured X-Ray Optics, (6 May 1985); doi: 10.1117/12.949655
Show Author Affiliations
A. Franks, National Physical Laboratory (United Kingdom)
B. Gale, National Physical Laboratory (United Kingdom)

Published in SPIE Proceedings Vol. 0563:
Applications of Thin Film Multilayered Structures to Figured X-Ray Optics
Gerald F. Marshall, Editor(s)

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