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Proceedings Paper

Sputter deposition system for controlled fabrication of multilayers
Author(s): R. P. Di Nardo; P. Z. Takacs; C. F. Majkrzak; P. M. Stefan
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Paper Abstract

A detailed description of a sputter deposition system constructed specifically for the fabrication of x-ray and neutron multilayer monochromators and supermirrors is given. One of the principal design criteria is to maintain precise control of film thickness and uniformity over large substrate areas. Regulation of critical system parameters is fully automated so that response to feedback control information is rapid and complicated layer thickness sequences can be deposited accurately and efficiently. The use of either DC or RF magnetron sources makes it possible to satisfy the diverse material requirements of both x-ray and neutron optics.

Paper Details

Date Published: 6 May 1985
PDF: 6 pages
Proc. SPIE 0563, Applications of Thin Film Multilayered Structures to Figured X-Ray Optics, (6 May 1985); doi: 10.1117/12.949648
Show Author Affiliations
R. P. Di Nardo, Brookhaven National Laboratory (United States)
P. Z. Takacs, Brookhaven National Laboratory (United States)
C. F. Majkrzak, Brookhaven National Laboratory (United States)
P. M. Stefan, Brookhaven National Laboratory (United States)


Published in SPIE Proceedings Vol. 0563:
Applications of Thin Film Multilayered Structures to Figured X-Ray Optics
Gerald F. Marshall, Editor(s)

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